ultrapure® R-EG Merk Donaldson

ultrapure® R-EG The electronic industry’ s requirements concerning the purity of auxiliary materials are rising together with the growing memory density and efficiency of the electronic elements. In order to meet these high requirements, gases like oxygen, argon, helium or nitrogen are filtered by the ultrafilter ultrapure® – the pure gas filter R-EG and its multilayered depthfilter medium R-TF. Absolute retention rates of particles with a size of only 0, 01 ¼ m guarantee a troublefree and a quantitatively consistent quality of production. Product description: The ultrafilter ultrapure® pure gas filterconsists of a 1.4404 ( 316L) stainless steel housing. The housing is electropolished from the inside and has a surface finish of Ra = 0, 8. Inside the housing it features a multilayer depthfilter, a medium that provides an absolute retention of particles up to 0, 01 ¼ m. The ultrapure® filter is prefered in the electronic industry as a point of use filter for gases like oxygen, argon, helium or nitrogen. ultrapure® R-EG The electronic industry’ s requirements concerning the purity of auxiliary materials are rising together with the growing memory density and efficiency of the electronic elements. The ultrapure® gas filter R-EG with depth filter R-TF Applications: The ultrapure® point of use filter is designed and developed for the following applications: • photo paint • ion donation • oxidation/ diffusion ovens • wafer drying • aerospace technology • filtration of solvents • gas supply and automatic control systems Contact telp: + 62 858 9038 2651, email diantamasukses( at) gmail.com and brazedplate( at) gmail.com